- •Preface
- •Imaging Microscopic Features
- •Measuring the Crystal Structure
- •References
- •Contents
- •1.4 Simulating the Effects of Elastic Scattering: Monte Carlo Calculations
- •What Are the Main Features of the Beam Electron Interaction Volume?
- •How Does the Interaction Volume Change with Composition?
- •How Does the Interaction Volume Change with Incident Beam Energy?
- •How Does the Interaction Volume Change with Specimen Tilt?
- •1.5 A Range Equation To Estimate the Size of the Interaction Volume
- •References
- •2: Backscattered Electrons
- •2.1 Origin
- •2.2.1 BSE Response to Specimen Composition (η vs. Atomic Number, Z)
- •SEM Image Contrast with BSE: “Atomic Number Contrast”
- •SEM Image Contrast: “BSE Topographic Contrast—Number Effects”
- •2.2.3 Angular Distribution of Backscattering
- •Beam Incident at an Acute Angle to the Specimen Surface (Specimen Tilt > 0°)
- •SEM Image Contrast: “BSE Topographic Contrast—Trajectory Effects”
- •2.2.4 Spatial Distribution of Backscattering
- •Depth Distribution of Backscattering
- •Radial Distribution of Backscattered Electrons
- •2.3 Summary
- •References
- •3: Secondary Electrons
- •3.1 Origin
- •3.2 Energy Distribution
- •3.3 Escape Depth of Secondary Electrons
- •3.8 Spatial Characteristics of Secondary Electrons
- •References
- •4: X-Rays
- •4.1 Overview
- •4.2 Characteristic X-Rays
- •4.2.1 Origin
- •4.2.2 Fluorescence Yield
- •4.2.3 X-Ray Families
- •4.2.4 X-Ray Nomenclature
- •4.2.6 Characteristic X-Ray Intensity
- •Isolated Atoms
- •X-Ray Production in Thin Foils
- •X-Ray Intensity Emitted from Thick, Solid Specimens
- •4.3 X-Ray Continuum (bremsstrahlung)
- •4.3.1 X-Ray Continuum Intensity
- •4.3.3 Range of X-ray Production
- •4.4 X-Ray Absorption
- •4.5 X-Ray Fluorescence
- •References
- •5.1 Electron Beam Parameters
- •5.2 Electron Optical Parameters
- •5.2.1 Beam Energy
- •Landing Energy
- •5.2.2 Beam Diameter
- •5.2.3 Beam Current
- •5.2.4 Beam Current Density
- •5.2.5 Beam Convergence Angle, α
- •5.2.6 Beam Solid Angle
- •5.2.7 Electron Optical Brightness, β
- •Brightness Equation
- •5.2.8 Focus
- •Astigmatism
- •5.3 SEM Imaging Modes
- •5.3.1 High Depth-of-Field Mode
- •5.3.2 High-Current Mode
- •5.3.3 Resolution Mode
- •5.3.4 Low-Voltage Mode
- •5.4 Electron Detectors
- •5.4.1 Important Properties of BSE and SE for Detector Design and Operation
- •Abundance
- •Angular Distribution
- •Kinetic Energy Response
- •5.4.2 Detector Characteristics
- •Angular Measures for Electron Detectors
- •Elevation (Take-Off) Angle, ψ, and Azimuthal Angle, ζ
- •Solid Angle, Ω
- •Energy Response
- •Bandwidth
- •5.4.3 Common Types of Electron Detectors
- •Backscattered Electrons
- •Passive Detectors
- •Scintillation Detectors
- •Semiconductor BSE Detectors
- •5.4.4 Secondary Electron Detectors
- •Everhart–Thornley Detector
- •Through-the-Lens (TTL) Electron Detectors
- •TTL SE Detector
- •TTL BSE Detector
- •Measuring the DQE: BSE Semiconductor Detector
- •References
- •6: Image Formation
- •6.1 Image Construction by Scanning Action
- •6.2 Magnification
- •6.3 Making Dimensional Measurements With the SEM: How Big Is That Feature?
- •Using a Calibrated Structure in ImageJ-Fiji
- •6.4 Image Defects
- •6.4.1 Projection Distortion (Foreshortening)
- •6.4.2 Image Defocusing (Blurring)
- •6.5 Making Measurements on Surfaces With Arbitrary Topography: Stereomicroscopy
- •6.5.1 Qualitative Stereomicroscopy
- •Fixed beam, Specimen Position Altered
- •Fixed Specimen, Beam Incidence Angle Changed
- •6.5.2 Quantitative Stereomicroscopy
- •Measuring a Simple Vertical Displacement
- •References
- •7: SEM Image Interpretation
- •7.1 Information in SEM Images
- •7.2.2 Calculating Atomic Number Contrast
- •Establishing a Robust Light-Optical Analogy
- •Getting It Wrong: Breaking the Light-Optical Analogy of the Everhart–Thornley (Positive Bias) Detector
- •Deconstructing the SEM/E–T Image of Topography
- •SUM Mode (A + B)
- •DIFFERENCE Mode (A−B)
- •References
- •References
- •9: Image Defects
- •9.1 Charging
- •9.1.1 What Is Specimen Charging?
- •9.1.3 Techniques to Control Charging Artifacts (High Vacuum Instruments)
- •Observing Uncoated Specimens
- •Coating an Insulating Specimen for Charge Dissipation
- •Choosing the Coating for Imaging Morphology
- •9.2 Radiation Damage
- •9.3 Contamination
- •References
- •10: High Resolution Imaging
- •10.2 Instrumentation Considerations
- •10.4.1 SE Range Effects Produce Bright Edges (Isolated Edges)
- •10.4.4 Too Much of a Good Thing: The Bright Edge Effect Hinders Locating the True Position of an Edge for Critical Dimension Metrology
- •10.5.1 Beam Energy Strategies
- •Low Beam Energy Strategy
- •High Beam Energy Strategy
- •Making More SE1: Apply a Thin High-δ Metal Coating
- •Making Fewer BSEs, SE2, and SE3 by Eliminating Bulk Scattering From the Substrate
- •10.6 Factors That Hinder Achieving High Resolution
- •10.6.2 Pathological Specimen Behavior
- •Contamination
- •Instabilities
- •References
- •11: Low Beam Energy SEM
- •11.3 Selecting the Beam Energy to Control the Spatial Sampling of Imaging Signals
- •11.3.1 Low Beam Energy for High Lateral Resolution SEM
- •11.3.2 Low Beam Energy for High Depth Resolution SEM
- •11.3.3 Extremely Low Beam Energy Imaging
- •References
- •12.1.1 Stable Electron Source Operation
- •12.1.2 Maintaining Beam Integrity
- •12.1.4 Minimizing Contamination
- •12.3.1 Control of Specimen Charging
- •12.5 VPSEM Image Resolution
- •References
- •13: ImageJ and Fiji
- •13.1 The ImageJ Universe
- •13.2 Fiji
- •13.3 Plugins
- •13.4 Where to Learn More
- •References
- •14: SEM Imaging Checklist
- •14.1.1 Conducting or Semiconducting Specimens
- •14.1.2 Insulating Specimens
- •14.2 Electron Signals Available
- •14.2.1 Beam Electron Range
- •14.2.2 Backscattered Electrons
- •14.2.3 Secondary Electrons
- •14.3 Selecting the Electron Detector
- •14.3.2 Backscattered Electron Detectors
- •14.3.3 “Through-the-Lens” Detectors
- •14.4 Selecting the Beam Energy for SEM Imaging
- •14.4.4 High Resolution SEM Imaging
- •Strategy 1
- •Strategy 2
- •14.5 Selecting the Beam Current
- •14.5.1 High Resolution Imaging
- •14.5.2 Low Contrast Features Require High Beam Current and/or Long Frame Time to Establish Visibility
- •14.6 Image Presentation
- •14.6.1 “Live” Display Adjustments
- •14.6.2 Post-Collection Processing
- •14.7 Image Interpretation
- •14.7.1 Observer’s Point of View
- •14.7.3 Contrast Encoding
- •14.8.1 VPSEM Advantages
- •14.8.2 VPSEM Disadvantages
- •15: SEM Case Studies
- •15.1 Case Study: How High Is That Feature Relative to Another?
- •15.2 Revealing Shallow Surface Relief
- •16.1.2 Minor Artifacts: The Si-Escape Peak
- •16.1.3 Minor Artifacts: Coincidence Peaks
- •16.1.4 Minor Artifacts: Si Absorption Edge and Si Internal Fluorescence Peak
- •16.2 “Best Practices” for Electron-Excited EDS Operation
- •16.2.1 Operation of the EDS System
- •Choosing the EDS Time Constant (Resolution and Throughput)
- •Choosing the Solid Angle of the EDS
- •Selecting a Beam Current for an Acceptable Level of System Dead-Time
- •16.3.1 Detector Geometry
- •16.3.2 Process Time
- •16.3.3 Optimal Working Distance
- •16.3.4 Detector Orientation
- •16.3.5 Count Rate Linearity
- •16.3.6 Energy Calibration Linearity
- •16.3.7 Other Items
- •16.3.8 Setting Up a Quality Control Program
- •Using the QC Tools Within DTSA-II
- •Creating a QC Project
- •Linearity of Output Count Rate with Live-Time Dose
- •Resolution and Peak Position Stability with Count Rate
- •Solid Angle for Low X-ray Flux
- •Maximizing Throughput at Moderate Resolution
- •References
- •17: DTSA-II EDS Software
- •17.1 Getting Started With NIST DTSA-II
- •17.1.1 Motivation
- •17.1.2 Platform
- •17.1.3 Overview
- •17.1.4 Design
- •Simulation
- •Quantification
- •Experiment Design
- •Modeled Detectors (. Fig. 17.1)
- •Window Type (. Fig. 17.2)
- •The Optimal Working Distance (. Figs. 17.3 and 17.4)
- •Elevation Angle
- •Sample-to-Detector Distance
- •Detector Area
- •Crystal Thickness
- •Number of Channels, Energy Scale, and Zero Offset
- •Resolution at Mn Kα (Approximate)
- •Azimuthal Angle
- •Gold Layer, Aluminum Layer, Nickel Layer
- •Dead Layer
- •Zero Strobe Discriminator (. Figs. 17.7 and 17.8)
- •Material Editor Dialog (. Figs. 17.9, 17.10, 17.11, 17.12, 17.13, and 17.14)
- •17.2.1 Introduction
- •17.2.2 Monte Carlo Simulation
- •17.2.4 Optional Tables
- •References
- •18: Qualitative Elemental Analysis by Energy Dispersive X-Ray Spectrometry
- •18.1 Quality Assurance Issues for Qualitative Analysis: EDS Calibration
- •18.2 Principles of Qualitative EDS Analysis
- •Exciting Characteristic X-Rays
- •Fluorescence Yield
- •X-ray Absorption
- •Si Escape Peak
- •Coincidence Peaks
- •18.3 Performing Manual Qualitative Analysis
- •Beam Energy
- •Choosing the EDS Resolution (Detector Time Constant)
- •Obtaining Adequate Counts
- •18.4.1 Employ the Available Software Tools
- •18.4.3 Lower Photon Energy Region
- •18.4.5 Checking Your Work
- •18.5 A Worked Example of Manual Peak Identification
- •References
- •19.1 What Is a k-ratio?
- •19.3 Sets of k-ratios
- •19.5 The Analytical Total
- •19.6 Normalization
- •19.7.1 Oxygen by Assumed Stoichiometry
- •19.7.3 Element by Difference
- •19.8 Ways of Reporting Composition
- •19.8.1 Mass Fraction
- •19.8.2 Atomic Fraction
- •19.8.3 Stoichiometry
- •19.8.4 Oxide Fractions
- •Example Calculations
- •19.9 The Accuracy of Quantitative Electron-Excited X-ray Microanalysis
- •19.9.1 Standards-Based k-ratio Protocol
- •19.9.2 “Standardless Analysis”
- •19.10 Appendix
- •19.10.1 The Need for Matrix Corrections To Achieve Quantitative Analysis
- •19.10.2 The Physical Origin of Matrix Effects
- •19.10.3 ZAF Factors in Microanalysis
- •X-ray Generation With Depth, φ(ρz)
- •X-ray Absorption Effect, A
- •X-ray Fluorescence, F
- •References
- •20.2 Instrumentation Requirements
- •20.2.1 Choosing the EDS Parameters
- •EDS Spectrum Channel Energy Width and Spectrum Energy Span
- •EDS Time Constant (Resolution and Throughput)
- •EDS Calibration
- •EDS Solid Angle
- •20.2.2 Choosing the Beam Energy, E0
- •20.2.3 Measuring the Beam Current
- •20.2.4 Choosing the Beam Current
- •Optimizing Analysis Strategy
- •20.3.4 Ba-Ti Interference in BaTiSi3O9
- •20.4 The Need for an Iterative Qualitative and Quantitative Analysis Strategy
- •20.4.2 Analysis of a Stainless Steel
- •20.5 Is the Specimen Homogeneous?
- •20.6 Beam-Sensitive Specimens
- •20.6.1 Alkali Element Migration
- •20.6.2 Materials Subject to Mass Loss During Electron Bombardment—the Marshall-Hall Method
- •Thin Section Analysis
- •Bulk Biological and Organic Specimens
- •References
- •21: Trace Analysis by SEM/EDS
- •21.1 Limits of Detection for SEM/EDS Microanalysis
- •21.2.1 Estimating CDL from a Trace or Minor Constituent from Measuring a Known Standard
- •21.2.2 Estimating CDL After Determination of a Minor or Trace Constituent with Severe Peak Interference from a Major Constituent
- •21.3 Measurements of Trace Constituents by Electron-Excited Energy Dispersive X-ray Spectrometry
- •The Inevitable Physics of Remote Excitation Within the Specimen: Secondary Fluorescence Beyond the Electron Interaction Volume
- •Simulation of Long-Range Secondary X-ray Fluorescence
- •NIST DTSA II Simulation: Vertical Interface Between Two Regions of Different Composition in a Flat Bulk Target
- •NIST DTSA II Simulation: Cubic Particle Embedded in a Bulk Matrix
- •21.5 Summary
- •References
- •22.1.2 Low Beam Energy Analysis Range
- •22.2 Advantage of Low Beam Energy X-Ray Microanalysis
- •22.2.1 Improved Spatial Resolution
- •22.3 Challenges and Limitations of Low Beam Energy X-Ray Microanalysis
- •22.3.1 Reduced Access to Elements
- •22.3.3 At Low Beam Energy, Almost Everything Is Found To Be Layered
- •Analysis of Surface Contamination
- •References
- •23: Analysis of Specimens with Special Geometry: Irregular Bulk Objects and Particles
- •23.2.1 No Chemical Etching
- •23.3 Consequences of Attempting Analysis of Bulk Materials With Rough Surfaces
- •23.4.1 The Raw Analytical Total
- •23.4.2 The Shape of the EDS Spectrum
- •23.5 Best Practices for Analysis of Rough Bulk Samples
- •23.6 Particle Analysis
- •Particle Sample Preparation: Bulk Substrate
- •The Importance of Beam Placement
- •Overscanning
- •“Particle Mass Effect”
- •“Particle Absorption Effect”
- •The Analytical Total Reveals the Impact of Particle Effects
- •Does Overscanning Help?
- •23.6.6 Peak-to-Background (P/B) Method
- •Specimen Geometry Severely Affects the k-ratio, but Not the P/B
- •Using the P/B Correspondence
- •23.7 Summary
- •References
- •24: Compositional Mapping
- •24.2 X-Ray Spectrum Imaging
- •24.2.1 Utilizing XSI Datacubes
- •24.2.2 Derived Spectra
- •SUM Spectrum
- •MAXIMUM PIXEL Spectrum
- •24.3 Quantitative Compositional Mapping
- •24.4 Strategy for XSI Elemental Mapping Data Collection
- •24.4.1 Choosing the EDS Dead-Time
- •24.4.2 Choosing the Pixel Density
- •24.4.3 Choosing the Pixel Dwell Time
- •“Flash Mapping”
- •High Count Mapping
- •References
- •25.1 Gas Scattering Effects in the VPSEM
- •25.1.1 Why Doesn’t the EDS Collimator Exclude the Remote Skirt X-Rays?
- •25.2 What Can Be Done To Minimize gas Scattering in VPSEM?
- •25.2.2 Favorable Sample Characteristics
- •Particle Analysis
- •25.2.3 Unfavorable Sample Characteristics
- •References
- •26.1 Instrumentation
- •26.1.2 EDS Detector
- •26.1.3 Probe Current Measurement Device
- •Direct Measurement: Using a Faraday Cup and Picoammeter
- •A Faraday Cup
- •Electrically Isolated Stage
- •Indirect Measurement: Using a Calibration Spectrum
- •26.1.4 Conductive Coating
- •26.2 Sample Preparation
- •26.2.1 Standard Materials
- •26.2.2 Peak Reference Materials
- •26.3 Initial Set-Up
- •26.3.1 Calibrating the EDS Detector
- •Selecting a Pulse Process Time Constant
- •Energy Calibration
- •Quality Control
- •Sample Orientation
- •Detector Position
- •Probe Current
- •26.4 Collecting Data
- •26.4.1 Exploratory Spectrum
- •26.4.2 Experiment Optimization
- •26.4.3 Selecting Standards
- •26.4.4 Reference Spectra
- •26.4.5 Collecting Standards
- •26.4.6 Collecting Peak-Fitting References
- •26.5 Data Analysis
- •26.5.2 Quantification
- •26.6 Quality Check
- •Reference
- •27.2 Case Study: Aluminum Wire Failures in Residential Wiring
- •References
- •28: Cathodoluminescence
- •28.1 Origin
- •28.2 Measuring Cathodoluminescence
- •28.3 Applications of CL
- •28.3.1 Geology
- •Carbonado Diamond
- •Ancient Impact Zircons
- •28.3.2 Materials Science
- •Semiconductors
- •Lead-Acid Battery Plate Reactions
- •28.3.3 Organic Compounds
- •References
- •29.1.1 Single Crystals
- •29.1.2 Polycrystalline Materials
- •29.1.3 Conditions for Detecting Electron Channeling Contrast
- •Specimen Preparation
- •Instrument Conditions
- •29.2.1 Origin of EBSD Patterns
- •29.2.2 Cameras for EBSD Pattern Detection
- •29.2.3 EBSD Spatial Resolution
- •29.2.5 Steps in Typical EBSD Measurements
- •Sample Preparation for EBSD
- •Align Sample in the SEM
- •Check for EBSD Patterns
- •Adjust SEM and Select EBSD Map Parameters
- •Run the Automated Map
- •29.2.6 Display of the Acquired Data
- •29.2.7 Other Map Components
- •29.2.10 Application Example
- •Application of EBSD To Understand Meteorite Formation
- •29.2.11 Summary
- •Specimen Considerations
- •EBSD Detector
- •Selection of Candidate Crystallographic Phases
- •Microscope Operating Conditions and Pattern Optimization
- •Selection of EBSD Acquisition Parameters
- •Collect the Orientation Map
- •References
- •30.1 Introduction
- •30.2 Ion–Solid Interactions
- •30.3 Focused Ion Beam Systems
- •30.5 Preparation of Samples for SEM
- •30.5.1 Cross-Section Preparation
- •30.5.2 FIB Sample Preparation for 3D Techniques and Imaging
- •30.6 Summary
- •References
- •31: Ion Beam Microscopy
- •31.1 What Is So Useful About Ions?
- •31.2 Generating Ion Beams
- •31.3 Signal Generation in the HIM
- •31.5 Patterning with Ion Beams
- •31.7 Chemical Microanalysis with Ion Beams
- •References
- •Appendix
- •A Database of Electron–Solid Interactions
- •A Database of Electron–Solid Interactions
- •Introduction
- •Backscattered Electrons
- •Secondary Yields
- •Stopping Powers
- •X-ray Ionization Cross Sections
- •Conclusions
- •References
- •Index
- •Reference List
- •Index
326\ Chapter 20 · Quantitative Analysis: The SEM/EDS Elemental Microanalysis k-ratio Procedure for Bulk Specimens, Step-by-Step
. Table 20.10 Analysis of a type 316 stainless steel (mass
concentrations)
|
1st quantitative analysis |
2nd quantitative |
|
|
analysis |
|
|
|
Raw |
0.9861 ± 0.0009 |
1.0031 ± 0.0009 |
sum |
|
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|
Si |
0.0053 ± 0.0001 |
0.0053 ± 0.0001 |
Cr |
0.1705 ± 0.0003 |
0.1711 ± 0.0003 |
Mn |
|
0.0154 ± 0.0002 |
Fe |
0.6539 ± 0.0006 |
0.6545 ± 0.0006 |
Ni |
0.1328 ± 0.0005 |
0.1330 ± 0.0005 |
Mo |
0.0237 ± 0.0002 |
0.0238 ± 0.0002 |
the results listed in . Table 20.11 (first analysis). The analytical total is anomalously low at 0.7635. The second round of qualitative analysis of the fitting residuals from the first quantitative analysis in . Fig. 20.12c–e shows several new peaks that are identified: Sr, Y, and Zr in the P region and Ti, Pr, and Nd in the La-Ce region. When these elements are included in the second round of quantitative analysis, as listed in
. Table 20.11, the analytical total increases to 0.9629. The third round of qualitative analysis of the fitting residuals from the second quantitative analysis in . Fig. 20.12f,g shows Nb in the P region and Sm and Fe in the La-Ce region. After the third round of quantitative analysis, the analytical total increases to 0.9960, and the third round residuals are shown in . Fig. 20.12h, i superimposed on the residuals from rounds one and two, indicating only minor changes between rounds two and three. Should this analysis be repeated for a fourth round? The level of Nb that has been measured is only 0.0006 (600 ppm), and the confidence is this level is low. There remain some low level structures in the third analysis residuals, but to take this analysis further, the spectrum should be measured for additional time to increase the total count at least by a factor of four.
microstructure. Indeed, the great value of electron excited X-ray microanalysis is its capability to measure elemental composition on the spatial scale of a micrometer and finer to characterize this chemical microstructure.
As part of an effective analysis strategy, it is generally wise to make multiple measurements of each distinct region of interest of a specimen rather than just a single measurement. When a material is sampled at multiple locations under carefully controlled, reproducible analytical conditions, there will inevitably be variations in the results due to the natural statistical fluctuations in the numbers of measured X-rays, both for the characteristic and continuum background of the specimen and the standard. The question often arises when examining the variations in such replicate results if the material can be regarded as homogeneous or if the degree of variation in the results is indicative of actual specimen heterogeneity.
In electron-excited X-ray microanalysis, what is of ultimate importance is the precision of the composition rather than just that of an individual intensity measurement for an element. This point has been discussed in detail by Ziebold
(1967) and Lifshin et al. (1999). Note first that a k ratio consists actually of the averages of four measurements: Nsam, the mean intensity measured on the sample; Nsam(B), the corre-
sponding mean background at the same energy; Nstan, the intensity measured on the standard; and Nstan(B), the corre-
sponding background for the standard:
k = N |
sam |
− N |
sam ( |
B |
/ N |
stan |
− N |
stan ( |
B |
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(20.4) |
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) |
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) |
\ |
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In reality a single measurement of each of the four terms in Eq. (20.4) results in only a single estimate of k and many sets of measurements are required to approach the true mean value of k.
For multiple determinations of the k-ratio, Ziebold (1967) showed that the precision in the k-ratio (σk) is given by
2 |
= k |
2 |
(Nsam + Nsam (B)) / nsam (Nsam − Nsam (B))2 |
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σ k |
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+ Nstan (B)) / nstan (Nstan − Nstan (B))2 |
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+ (Nstan |
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20.5\ Is the Specimen Homogeneous?
For the most part, Nature seems to prefer heterogeneity on a 20 microscopic scale. That is, many combinations of two or more elements spontaneously form two or more phases, where a phase is defined as matter that is distinct in chemical composition and physical state, thus creating a chemical
\ |
(20.5) |
where N represents the mean of the set of measurements for each parameter, for example:
n |
|
Nsam = ∑Ni / nsam |
(20.6) |
i |
\ |
20.5 · Is the Specimen Homogeneous?
a 350 000 |
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300 000 |
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250 000 |
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Counts |
200 000 |
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150 000 |
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100 000 |
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50 000 |
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0 |
0.0 |
1.0 |
2.0 |
b
40 000
30 000
Counts |
20 000 |
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10 000 |
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0 0.0 |
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c |
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40 000 |
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30 000 |
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Counts |
20 000 |
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10 000 |
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0 |
0.0 |
1.02.0
1.02.0
327 |
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20 |
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kalimantan_Monazite
Monazite (Kalimantan, Indonesia)
E0 = 20 keV
3.0 |
4.0 |
5.0 |
6.0 |
7.0 |
8.0 |
9.0 |
10.0 |
Photon energy (keV)
kalimantan_Monazite
Analyze for
Major: P, La, Ce (O by stoichiometry)
Minor: Al, Si, Ca, Th
3.0 |
4.0 |
5.0 |
6.0 |
7.0 |
8.0 |
9.0 |
10.0 |
Photon energy (keV)
kalimantan_Mona3-1_20kV9p95nAMED95kHz8DT_400s Residual_Kalimantan_Mona3-1_La-Ce
3.0 |
4.0 |
5.0 |
6.0 |
7.0 |
8.0 |
9.0 |
10.0 |
Photon energy (keV)
. Fig. 20.12 Monazite (lanthanum-cerium phosphate mineral) at E0 = 20 keV; 0.1 keV to 30 keV = 48.7 million counts: a original spectrum; b vertical expansion; c Round 1: full spectrum residuals after first
quantitative analysis; d P-region, first residuals; e La-Ce-region, first residuals; Round 2: f P-region, second residuals; g La-Ce-region, second residuals; Round 3; h P-region, all residuals; i La-Ce-region, all residuals
\328 Chapter 20 · Quantitative Analysis: The SEM/EDS Elemental Microanalysis k-ratio Procedure for Bulk Specimens, Step-by-Step
d
Counts
e
Counts
40 000 |
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Kal_Mona_Si-P-FIT |
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30 000 |
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20 000 |
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10 000 |
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1.40 |
1.50 |
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1.60 |
1.70 |
|
1.80 |
1.90 |
2.00 |
|
2.10 |
2.20 |
2.30 |
|
2.40 |
2.50 |
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Photon energy (keV) |
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40 000 |
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Kalimantan_Monazite |
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Kal_Monazite_La-Ce-FIT |
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30 000 |
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20 000 |
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10 000 |
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0 |
4.0 |
4.2 |
4.4 |
4.6 |
4.8 |
5.0 |
5.2 |
5.4 |
5.6 |
5.8 |
6.0 |
6.2 |
6.4 |
6.6 |
6.8 |
7.0 |
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Photon energy (keV) |
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f
Counts
20
Kalimantan_Monazite
40 000 Kal_Mona_Si-P-Sr-Zr_FIT
30 000
20 000
10 000 |
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0 |
1.50 |
1.60 |
1.70 |
1.80 |
1.90 |
2.00 |
2.10 |
2.20 |
2.30 |
2.40 |
2.50 |
1.40 |
Photon energy (keV)
. Fig. 20.12 (continued)
20.5 · Is the Specimen Homogeneous?
g
40 000
30 000
Counts |
20 000 |
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10 000 |
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0 |
4.0 |
4.2 |
4.4 |
4.6 |
h
40 000
30 000
Counts |
20 000 |
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10 000 |
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0 |
1.50 |
1.60 |
|
1.40 |
329 |
|
20 |
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Kalimantan_Monazite
Kal_Monazite_Ti-La-Ce-Pr-Nd_FIT
4.8 |
5.0 |
5.2 |
5.4 |
5.6 |
5.8 |
6.0 |
6.2 |
6.4 |
6.6 |
6.8 |
7.0 |
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Photon energy (keV) |
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Kalimantan_Monazite
Kal_Mona_Si-P-Sr-Y-Zr-Nb_FIT
Kal_Mona_Si-P-Sr-Zr_FIT
Kal_Mona_Si-P-FIT
1.70 |
1.80 |
1.90 |
2.00 |
2.10 |
2.20 |
2.30 |
2.40 |
2.50 |
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Photon energy (keV) |
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i
Counts
Kalimantan_Monazite
40 000 Kal_Monazite_Ti-La-Ce-Pr-Nd_FIT
Kal_Mona_Ti-La-Ce-Pr-Nd_Sm_Fe-FIT
Kal_Monazite_La-Ce_FIT
30 000
20 000 |
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10 000 |
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0 |
4.0 |
4.2 |
4.4 |
4.6 |
4.8 |
5.0 |
5.2 |
5.4 |
5.6 |
5.8 |
6.0 |
6.2 |
6.4 |
6.6 |
6.8 |
7.0 |
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Photon energy (keV) |
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. Fig. 20.12 (continued)
330\ Chapter 20 · Quantitative Analysis: The SEM/EDS Elemental Microanalysis k-ratio Procedure for Bulk Specimens, Step-by-Step
. Table 20.11 Analysis of a monazite |
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Round |
O (by assumed |
Al |
Si |
P |
Ca |
Ti |
|
stoichiometry) |
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|
First analysis |
0.2363 ± 0.0008 |
0.0013 ± 0.0000 |
0.0049 ± 0.0000 |
0.1114 ± 0.0006 |
0.0007 ± 0.0000 |
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Second analysis |
0.2828 ± 0.0009 |
0.0016 ± 0.0000 |
0.0059 ± 0.0001 |
0.1240 ± 0.0007 |
0.0007 ± 0.0000 |
0.0071 ± 0.0001 |
Third analysis |
0.2908 ± 0.0010 |
0.0015 ± 0.0000 |
0.0061 ± 0.0001 |
0.1263 ± 0.0007 |
0.0007 ± 0.0000 |
0.0072 ± 0.0001 |
Element |
Fe |
Sr |
Y |
Zr |
Nb |
La |
First analysis |
|
|
|
|
|
0.1359 ± 0.0002 |
Second analysis |
|
0.0016 ± 0.0001 |
0.0098 ± 0.0002 |
0.0113 ± 0.0002 |
|
0.1585 ± 0.0003 |
Third analysis |
0.0022 ± 0.0001 |
0.0028 ± 0.0001 |
0.0030 ± 0.0002 |
0.0117 ± 0.0002 |
0.0006 ± 0.0001 |
0.1591 ± 0.0003 |
Element |
Ce |
Pr |
Nd |
Sm |
Th |
Raw Sum |
First analysis |
0.2692 ± 0.0004 |
|
|
|
0.0038 ± 0.0001 |
0.7635 ± 0.0011 |
Second analysis |
0.2699 ± 0.0004 |
0.0221 ± 0.0003 |
0.0750 ± 0.0003 |
|
0.0040 ± 0.0001 |
0.9629 ± 0.0013 |
Third analysis |
0.2709 ± 0.0004 |
0.0221 ± 0.0003 |
0.0751 ± 0.0003 |
0.0073 ± 0.0005 |
0.0040 ± 0.0001 |
0.9960 ± 0.0030 |
and nsam and nstan are the numbers of measurements of the sample and standard. The corresponding precision in the
measurement of the concentration is given by
2 |
|
2 |
(Nsam |
+ Nsam (B)) / nsam (Nsam |
− Nsam (B))2 |
+ |
= C |
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σC |
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+ Nstan (B)) / nstan (Nstan |
− Nstan (B))2 |
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(Nstan |
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{ |
( |
) |
} |
2 |
1− |
a− 1 |
C / a |
||
\ |
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|
|
(20.7) |
where the parameter “a” is the constant in the hyperbolic relation (Ziebold and Ogilvie 1964):
( |
− k |
) |
( |
− C |
) |
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1 |
|
/ k = a 1 |
|
/ C |
\ |
(20.8) |
||
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|
The parameter “a” can be calculated using Eq. (20.8) with the measured value of k and the calculated value of C from the quantitative analysis software results.
Equation 20.4 makes it possible to assess statistical uncertainty in an estimate of composition. For example, it can be used to construct a confidence interval (e.g., ± 1.96σC gives the 95 % confidence interval) for the difference of two sam-
20 ples or to plan how many counts must be collected to be able to estimate differences between two samples at the desired level of precision. The calculation of the confidence interval is based on the normal distribution of the estimate of C for large samples. This confidence interval is only based on the statistical uncertainty inherent in the X-ray counts. The full error budget requires also estimating the uncertainty in the principal matrix corrections for absorption (A) and scattering/energy loss (Z) (Ritchie and Newbury 2012). NIST
DTSA-II provides these error estimates in addition to the error in the measurement of the k-ratio.
The use of Eq. (20.7) to calculate σc for an alloy with a composition of 0.215-Mo_0.785-W (21.5 wt % Mo and 78.5 wt % W) and the spectrum shown in . Fig. 20.13 is as follows:
First determine the number of Mo L3-M5 and W L3-M5 counts measured on the sample and standard as well as the corresponding background counts for each:
At E0 = 20 keV and iB =10 nA for an SDD-EDS of Ω= 0.0077 sr, the spectrum of the alloy and the residual after peak-fitting, as shown in . Fig. 20.13, gives the following intensities for a single measurement:
Mo L3-M5 bkg |
W L3-M5 bkg |
||
884416 |
195092 |
868516 |
111279 |
The pure element standards gave the following values for a single measurement:
7016889 |
211262 |
1147787 |
134382 |
These intensities yield the following mean k-values: 0.1260 0.7567
From the NIST DTSA-II results and Eq. (20.6):
Mo k = 0.1235 C = 0.2132 (normalized C = 0.2148) a = 1.92 W k = 0.7540 C = 0.7792 (normalized C = 0.7852) a = 1.15
Substituting these values in Eq. (20.4) gives
Mo W σC = 0.0003 σC = 0.0012
Thus, from the statistics of the X-ray counts measured for the alloy and the pure element standards, the 95 % confidence limit for reproducibility is given by ± 1.96σC